Nova presents a unique portfolio to meet the challenges of next-generation logic manufacturing

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REHOVOT, Israel, February 17, 2022 /PRNewswire/ — Nova (Nasdaq: NVMI) today announced its metrology portfolio for Advanced Gate-All Around (GAA). To enhance its market-leading portfolio, the company is unveiling several advanced solutions uniquely equipped to address the manufacturing challenges of next-generation logic devices.

As the semiconductor industry moves into advanced technology nodes, process challenges increase dramatically. Throughput time is becoming a critical parameter, in conflict with an increasing number of process steps, higher sampling and shrinking design rules. This conflict is further complicated by the need to measure on the device and in the tool, as test structures are no longer representative of the actual process. Additionally, an abundance of new materials requires online control of parameters, such as thickness, composition, stress, and local variations within the device. To meet these needs, process control solutions must be more precise and applicable to complex 3D structures and new materials, applied to more layers, and used for more physical and chemical parameters online.

In logic fabrication, the most important transition is from finned field-effect transistor (FinFET) to all-around gated transistor (GAA), which complicates the fabrication process. Nanosheet transistors impose new constraints, dictating comprehensive characterization of multiple individual nanosheets for dimensional and material properties. Several critical steps of nanosheets, such as the formation of the inner spacer and the formation of the replacement metal gate, require much tighter process control.

“Nova’s rich and differentiated portfolio is designed to meet the challenges of manufacturing next-generation devices,” said Eitan Oppenhaim, President and CEO. “In addition to complex design, materials are becoming an increasingly crucial key to device evolution, and our high investment in this area provides our customers with unique complementary value. This is further enhanced by the synergy between our market-leading dimensional metrology, revolutionary materials metrology portfolio and the recent addition of chemical metrology.”

Nova’s complementary offering allows customers to gain greater insight into the most complex semiconductor structures through a broader view of geometric dimensions, material physical properties and chemical analysis. The overall solution has already been deployed in the market and is being used by major customers to stabilize GAA process steps and increase yield.

Nova’s rich next-gen portfolio includes:

Nova PRISM enables superior metrology performance in critical applications, made possible by the platform’s Spectral Interferometry (SI) technology. SI technology has been proven to add a whole new dimension of spectral information inaccessible to current traditional optical CD methods by providing absolute phase information that improves sensitivity to low target parameters, specifically required by the complexity introduced in the new rules of GAA design.

Nova i570 is Nova’s most capable integrated metrology platform for high-volume manufacturing, reinforcing Nova’s leadership in this area. The platform enhances total in-line measurement capabilities in small structures and multiple layers.

Nova METRION® brings SIMS technology to high-volume fabrication, enabling depth profiles of material composition, previously limited to a laboratory environment, in the critical material deposition step in nanosheet fabrication. Manufacturers must tightly control material concentration and uniform deposition on individual nanosheets.

Nova ELIPSON™ uses advanced Raman spectroscopy technology for optical materials metrology (OMM) to extract material properties from in-die structures by rapid and non-destructive means. ELIPSON™ provides multiple solutions for next-generation production challenges, including strain formation and defectivity measurements throughout the process.

Nova VERAFLEX® IV is the latest industry standard for in-line and in-array X-ray photoelectron spectroscopy (XPS) with integrated X-ray fluorescence (XRF). VERAFLEX® IV provides direct measurement control over monolayer film stacks and dopant concentrations by generating the industry’s highest X-ray flux and the proprietary optical system needed to process complex structures.

All platforms are unified by Nova’s machine learning software suite, NovaFIT 2.0, the company’s newest machine learning solution, powered by advanced algorithms and a state-of-the-art computational layer.

About Nova:

Nova is a leading innovator and key provider of materials, optical and chemical metrology solutions for advanced process control in semiconductor manufacturing. Nova delivers continuous innovation by providing state-of-the-art, high-performance metrology solutions for efficient process control throughout the semiconductor manufacturing lifecycle. Nova’s product portfolio, which combines high-precision hardware and state-of-the-art software, provides customers with deep insight into the development and production of the most advanced semiconductor devices. Nova’s unique ability to deliver innovative solutions enables its customers to improve performance, increase product yields and accelerate time to market. Nova acts as a partner to semiconductor manufacturers from its offices around the world. Additional information can be found on the Nova website link – https://www.novami.com/.

Nova is listed on Nasdaq & TASE, ticker symbol of Nasdaq NVMI

Forward-looking statement:

This press release contains forward-looking statements within the meaning of the safe harbor provisions of the Private Securities Litigation Reform Act of 1995 relating to future events or our future performance, such as statements regarding, but not limited to, anticipated growth opportunities and projections about our business and its future revenues, expenses and profitability. Forward-looking statements involve known and unknown risks, uncertainties and other factors that could cause our actual results, levels of activity, performance or achievements to be materially different from future results, levels of activity, performance or achievements. expressed or implied by these forward-looking statements. – look at the statements. Factors that could affect our results, performance, circumstances or achievements include, but are not limited to, the following: catastrophic events such as the COVID-19 outbreak; the increase in information technology security threats and sophisticated computer crime; foreign political and economic risks; changes in United States trade policies; inability to protect intellectual property; exposure to open source technology; the inability to compete effectively or respond to rapid technological change; consolidation in our industry; difficulty in predicting the duration and strength of any downturn or expansion in the market we target; factors that adversely affect prices and demand for our product lines; risks associated with the introduction of new product lines which may require us to allocate time and financial resources; dependence on a small number of large customers; reliance on a single manufacturing facility per product line; dependence on a limited number of suppliers; difficulty in integrating current or future acquisitions; long sales cycle and customer order delays; political, economic and military instability Israel; risks relating to our convertible notes; currency fluctuations; and quarterly fluctuations in our operating results. We cannot guarantee future results, activity levels, performance or achievements. The matters discussed in this press release also involve risks and uncertainties summarized under the heading “Risk Factors” in Nova’s Annual Report on Form 20-F for the year ended December 31, 2020 filed with the Securities and Exchange Commission on March 1, 2021. These factors are updated from time to time by filing reports and registration statements with the Securities and Exchange Commission. Nova Ltd. assumes no obligation to update the forward-looking information contained in this press release

Company Contact:

Dror DavidFinancial director
Tel: +972-73-229-5760
E-mail: [email protected]

Contact with Investor Relations:

Miri Segal
MS-IR LLC
Tel: +917-607-8654
E-mail: [email protected]

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